发明名称 LOW VOLTAGE ELECTRON SOURCE WITH SELF ALIGNED GATE APERTURES, FABRICATION METHOD THEREOF, AND DEVICES USING THE ELECTRON SOURCE
摘要 A method of fabricating an electron source having a self-aligned gate aperture is disclosed. A substrate is deposited on a first conductive layer. Over the first conductive layer an emitter layer is deposited. The emitter layer includes one or a plurality of spaced-apart nano-structures and a solid surface with nano-structures protruding above the surface. An insulator is conformally deposited over the emitter layer surface and forms a post from each protruding nano-structure. A second conductive layer is deposited over the insulator and the second conductive layer and the insulator are removed from the nano-structures such that apertures are formed in the second conductive layer and at least the ends of the nano-structures are exposed at the centers of said apertures.
申请公布号 US2009039754(A1) 申请公布日期 2009.02.12
申请号 US20070929615 申请日期 2007.10.30
申请人 TOLT, ZHIDAN L. 发明人 TOLT ZHIDAN L.
分类号 H01J1/304 主分类号 H01J1/304
代理机构 代理人
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