| 摘要 |
<p>An exposure apparatus and device manufacturing method is provided to suppress the deterioration of the exposure accuracy due to evaporation heat by forming a return port on an assistant plate holder. In an exposure apparatus and device manufacturing method, an exposure apparatus exposing a substrate through a liquid comprise a substrate stage which holds the substrate(40) and moves it. A top plate(303), a substrate holder(400) holding the substrate, and assistant plate holder(401) holding the assistant plate(43) are arranged on the substrate stage. A substrate holder comprises an extension part(400a) having the surface facing the rear side of the assistant plate which is held with the assistant plate holder. A return port(403) collecting the liquid flowing into a gap between the surface of the rear side of the assistant plate and the extension part is installed at the assistant plate holder.</p> |
