| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a gas cleaning apparatus which can remove fine particles irrespectively of their sizes without lowering a gas feed efficiency. <P>SOLUTION: A loader module 14 in a substrate treatment system 10 is provided with a fan filter unit 20 which generates a descending air stream in the inner space of a conveying chamber 15. The fan filter unit 20 is provided with a fan 21 which generates an air stream and a reticular filter 22 that traps and removes concomitant particles in the air stream, and an irradiation heater 23 interposed between the fan 21 and the filter 22 and further provided with a high-temperature part 24 situated over the air stream and being higher in temperature than the filter 22. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
