发明名称 SEMICONDUCTOR STRUCTURES INCLUDING TIGHT PITCH CONTACTS AND METHODS TO FORM SAME
摘要 Methods of fabricating semiconductor structures incorporating tight pitch contacts aligned with active area features and of simultaneously fabricating self-aligned tight pitch contacts and conductive lines using various techniques for defining patterns having sublithographic dimensions. Semiconductor structures having tight pitch contacts aligned with active area features and, optionally, aligned conductive lines are also disclosed, as are semiconductor structures with tight pitch contact holes and aligned trenches for conductive lines.
申请公布号 WO2009020773(A2) 申请公布日期 2009.02.12
申请号 WO2008US71031 申请日期 2008.07.24
申请人 MICRON TECHNOLOGY, INC.;TRAN, LUAN, C. 发明人 TRAN, LUAN, C.
分类号 H01L21/302 主分类号 H01L21/302
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