| 发明名称 |
EXPOSURE APPARATUS, INFORMATION PROCESSING APPARATUS, AND METHOD OF MANUFACTURING DEVICE |
| 摘要 |
An exposure apparatus for exposing a substrate to radiant energy comprises a controller configured to determine a shot layout based on data representing a surface shape of the substrate, and an exposure unit configured to expose the substrate to the radiant energy in accordance with the shot layout determined by the controller.
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| 申请公布号 |
US2009040480(A1) |
申请公布日期 |
2009.02.12 |
| 申请号 |
US20080174915 |
申请日期 |
2008.07.17 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KAWASHIMA JUN;KOJIMA YUJI |
| 分类号 |
G03B27/32;G03B27/42 |
主分类号 |
G03B27/32 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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