| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method having a high film deposition rate and sufficient coverage properties to a step on a base material, and a low-cost film deposition system with a simple system constitution. SOLUTION: The inside of a chamber is provided with: a rotatable rotary drum composed in such a manner that the base material can be arranged at the circumferential face thereof; and a magnetron magnetic circuit arranged so as to be opposed to the base material, and the magnetron magnetic circuit is composed so as to be movable in the tangential direction of the rotary drum. COPYRIGHT: (C)2009,JPO&INPIT
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