| 摘要 |
PROBLEM TO BE SOLVED: To provide a microlens comprising an array of unit lenses each having a rectangular feature in a plan view formed by a photolithographic step of applying a photosensitive resist on a substrate, exposing the photosensitive resist for patterning by use of a distributed density mask and developing, and to provide a microlens having improved condensing property of the rectangular lenses and efficiently irradiating a photodetector. SOLUTION: The distributed density mask has a slit pattern formed between lens patterns for forming unit lenses adjacent to each other. In each unit lens, the curvature of sphere close to the ends in a diagonal direction of the lens is equal to that of the center portion. COPYRIGHT: (C)2009,JPO&INPIT
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