| 摘要 |
A positive resist composition for immersion exposure including a resin component (A) which has an acid dissociable dissolution inhibiting group and exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group, the amount of the structural unit (a3) based on the combined total of all structural units constituting the resin component (A) being 3 to 12 mol %.
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