发明名称 Structurally-stabilized capacitors and method of making of same
摘要 Structurally-stable, tall capacitors having unique three-dimensional architectures for semiconductor devices are disclosed. The capacitors include monolithically-fabricated upright microstructures, i.e., those having large height/width (H/W) ratios, which are mechanical reinforcement against shear forces and the like, by a brace layer that transversely extends between lateral sides of at least two of the free-standing microstructures. The brace layer is formed as a microbridge type structure spanning between the upper ends of the two or more microstructures.
申请公布号 US7488665(B2) 申请公布日期 2009.02.10
申请号 US20040973343 申请日期 2004.10.27
申请人 MICRON TECHNOLOGY, INC. 发明人 AGARWAL VISHNU K.;SANDHU GURTEJ
分类号 H01L21/20;H01L21/02;H01L21/768;H01L21/8242;H01L27/02;H01L27/108;H01L29/76;H01L29/94;H01L31/119 主分类号 H01L21/20
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