发明名称 |
SOLID-STATE IMAGING ELEMENT, SOLID-STATE IMAGING DEVICE, CAMERA, AND DRIVE METHOD |
摘要 |
A semiconductor device is a solid-state imaging element formed on a semiconductor substrate and having an overflow drain structure which discharges an excessive charge generated in a plurality of photoelectric elements (1). The solid-state imaging element reads out a signal charge accumulated in the photoelectric conversion element (1) and reads it out via a gate electrode (18) to a vertical transfer unit (2a). The solid-state imaging element includes: a first voltage generation circuit which applies to the semiconductor substrate, a substrate voltage which defines the overflow barrier height in the overflow drain structure; and a second voltage generation circuit which selectively generates a first voltage and a second voltage indicating the wave height of a pulse superposed on the substrate voltage at a generation timing of a read-out pulse applied to the read-out gate electrode (18). |
申请公布号 |
WO2009016798(A1) |
申请公布日期 |
2009.02.05 |
申请号 |
WO2008JP01834 |
申请日期 |
2008.07.09 |
申请人 |
PANASONIC CORPORATION;HASUKA, TSUYOSHI;KURIYAMA, TOSHIHIRO;MORI, HIROYUKI;MANABE, JUNJI |
发明人 |
HASUKA, TSUYOSHI;KURIYAMA, TOSHIHIRO;MORI, HIROYUKI;MANABE, JUNJI |
分类号 |
H01L27/148;H04N5/335;H04N5/347;H04N5/359;H04N5/369;H04N5/372 |
主分类号 |
H01L27/148 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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