| 发明名称 |
APC SYSTEM AND MULTIVARIATE MONITORING METHOD FOR PLASMA PROCESS MACHINE |
| 摘要 |
An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system.
|
| 申请公布号 |
US2009033915(A1) |
申请公布日期 |
2009.02.05 |
| 申请号 |
US20080248547 |
申请日期 |
2008.10.09 |
| 申请人 |
MACRONIX INTERNATIONAL CO., LTD. |
发明人 |
LUOH TUUNG;HSIEH SHENG-HUI;LUO SHING-ANN;SU CHIN-TA;YANG TA-HUNG;CHEN KUANG-CHAO |
| 分类号 |
G01N21/00;H01L21/30;H01L21/3065 |
主分类号 |
G01N21/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
