| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition from which a small amount of substance elutes into a liquid for immersion exposure kept in contact with the composition in immersion exposure, and which excels in sensitivity and resolution and can form a resist film giving a good pattern profile. <P>SOLUTION: The radiation-sensitive resin composition is used for forming a resist film for use in a resist pattern forming method including an immersion exposure step using bicyclohexyl as a liquid for immersion exposure, wherein when the formed resist film is immersed in bicyclohexyl for 10 s before exposure, a rate of change in the film thickness is ≤6%, and when the resist film is immersed in bicyclohexyl for 10 s after exposure, a rate of change in the film thickness is also ≤6%. <P>COPYRIGHT: (C)2009,JPO&INPIT |
