发明名称 CORRECTOR FOR CHARGED-PARTICLE BEAM ABERRATION AND CHARGED-PARTICLE BEAM APPARATUS
摘要 In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to extend through the contour of radial planes each radiating from the beam emission axis representing a rotary axis and each having a circular arc which subtends a divisional angle resulting from division of a circumferential plane by a natural number larger than 2 so that a superposed magnetic field may be generated on the incident axis of the charged-particle beam and the trajectory of the charged-particle beam may be controlled by the superposed magnetic field.
申请公布号 US2009032722(A1) 申请公布日期 2009.02.05
申请号 US20080183622 申请日期 2008.07.31
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 ITO HIROYUKI;SASAKI YUKO;HIGUCHI YOSHIYA;KAWASAKI TAKESHI
分类号 H01J3/14 主分类号 H01J3/14
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