| 摘要 |
A substrate cleaning apparatus is provided to increase the productivity of the substrate processing by performing the cleaning process in the fast time. A substrate cleaning apparatus(100) comprises a supporting member(120), a cleaning unit(140), a processing solution supply part(150), and a chamber(110). A substrate(10) is settled in the supporting member. The cleaning unit includes a plurality of nozzles(143a) on the upper side of the supporting member. The cleaning unit sprays the processing liquid on the top of the substrate by using nozzles. The processing solution supply part supplies the processing liquid to the cleaning unit.
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