Adjustment method, exposure method, device manufacturing method, and exposure apparatus

摘要

An adjustment method for adjusting an illumination condition in illuminating an original plate (30) using an illumination optical system (20) and projecting an image of a pattern formed on the original plate onto a substrate (50) through a projection optical system (40) includes measuring a polarization state of light that has passed through the illumination optical system, the original plate, and the projection optical system in a state where the original plate is located on an object plane of the projection optical system, and adjusting the polarization state based on the measured polarization state.