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经营范围
发明名称
Method of forming gate patterns for peripheral circuitry and semiconductor device formed thereby
摘要
申请公布号
KR100881130(B1)
申请公布日期
2009.02.02
申请号
KR20070051521
申请日期
2007.05.28
申请人
发明人
分类号
H01L21/027;H01L21/336
主分类号
H01L21/027
代理机构
代理人
主权项
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