NOZZLE AND APPARATUS FOR COATING A PROCESSING LIQUID HAVING THE SAME

摘要

A nozzle and an apparatus for coating processing liquid including the same are provided to coat the processing liquid precisely by controlling the suck back position of the spray nozzles arranged in a plurality of substrates. A nozzle unit includes a spray nozzle(30) and a suck-back display unit(50). The spray nozzle is connected to a processing liquid supply source(10) through a supply line(20) and sprays the processing liquid for forming a thin film in an upper part of the substrate. The spray nozzle is connected to a suck back valve(40). The processing liquid after spraying is sucked back through the suck back valve. The suck-back display unit is formed in the spray part of the spray nozzle. The suck back processing liquid is stopped in the processing liquid discharging path inside the spray unit. The position of the processing liquid is displayed by the suck back display unit.