| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus for cleaning a substrate capable of preventing contamination caused by foreign matters generated at substrate edge and inhibiting deterioration in yield caused by the cleaning of the substrate edge, and a substrate cleaning method. SOLUTION: Substrate cleaners 1A and 1B for cleaning the edge W1 of a substrate W includes a substrate holding means 2 for holding the substrate W in an approximately horizontal posture and capable of rotating the substrate W around a vertical axis, and a cleaning liquid spraying means 7 for spraying a cleaning liquid to the edge W1 of the substrate W held by the holding means 2 and rotating at a predetermined rotation speed. The cleaning liquid spraying means 7 sprays the cleaning liquid toward the edge W1 of the substrate W from a sideway. COPYRIGHT: (C)2009,JPO&INPIT
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