| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electron beam drawing method by which a desired fine pattern can be drawn with satisfactory productivity when a stamper original plate for forming a discrete track medium is drawn by using an electron beam. <P>SOLUTION: In the electron beam drawing method wherein an electron beam drawing device provided with a stage on which a substrate is placed, a movement mechanism moving the stage in a horizontal direction and a rotation mechanism rotating the stage is used and the substrate on which a photosensitive resin film is applied is placed on the stage and the photosensitive resin film is irradiated with the electron beam to draw a pattern extending in a radial direction while the substrate on the stage is rotated and moved in a horizontal direction, the electron beam is deflected in a direction parallel to the rotation direction of the substrate so that the relative movement speed of an electron beam radiation position on the substrate surface in the direction parallel to the rotation direction of the substrate is made to be slower than the linear speed of the substrate when viewed from a drawing starting position in the pattern drawing revolution. <P>COPYRIGHT: (C)2009,JPO&INPIT |
