| 摘要 |
PROBLEM TO BE SOLVED: To provide a barrel polishing apparatus having a novel configuration, wherein the apparatus continues a polishing operation even when the existing quantity of polishing liquid is small, and shortens a polishing time by increasing polishing force. SOLUTION: In the barrel polishing apparatus, workpieces and media are appropriately placed in a polishing barrel together with polishing liquid or cleaning liquid so as to form a mass composed of the aggregate of the workpieces and the media, and the mass is mixed and fluidized in order to perform the polishing. The barrel polishing apparatus comprises a liquid supply device 14 and a liquid discharge device 18 for the polishing barrel 22. The liquid supply device 14 is configured so as to selectively and continuously supply the polishing liquid or the cleaning liquid. The liquid discharge device 18 is configured such that the polishing liquid or water is continuously discharged while displacingly moving through (flowing through) the clearances between the workpieces and the media, the clearances being formed by the mixing and fluidization of the mass M. COPYRIGHT: (C)2009,JPO&INPIT |
