| 发明名称 |
Hydroxy-amino thermally cured undercoat for 193 NM lithography |
| 摘要 |
<p>A photolithographic sensitive coated substrate comprising a thermally cured undercoat on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat.</p> |
| 申请公布号 |
EP1634916(B1) |
申请公布日期 |
2009.01.21 |
| 申请号 |
EP20050024391 |
申请日期 |
2000.03.10 |
| 申请人 |
FUJIFILM ELECTRONIC MATERIALS USA, INC. |
发明人 |
FOSTER, PATRICK;SLATER, SIDNEY GEORGES;STEINHAUSLER, THOMAS;BLAKENEY, ANDREW J.;BIAFORE, JOHN JOSEPH |
| 分类号 |
C08K5/3492;G03F7/11;B41C1/10;B41M5/36;B41N1/08;B41N1/14;C08F4/04;C08F8/32;C08F12/22;C08F220/28;C08K5/42;C08L29/02;C08L29/08;C09D125/08;C09D125/18;G03C1/492;G03C1/76;G03F7/039;G03F7/075;G03F7/09;G03F7/26;G03F7/40;H01L21/027 |
主分类号 |
C08K5/3492 |
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