发明名称 Process for producing GaN substrate
摘要 A process for producing an inexpensive large high-quality GaN substrate which comprises forming a MgO buffer layer on a high-quality substrate, generating a ZnO layer on the MgO buffer layer while performing polarity control, growing a GaN layer on the ZnO layer while performing polarity control, and melting the ZnO layer, thereby producing a GaN substrate.
申请公布号 US7479188(B2) 申请公布日期 2009.01.20
申请号 US20050549018 申请日期 2005.09.15
申请人 TOHOKU TECHNO ARCH CO., LTD. 发明人 YAO TAKAFUMI;SUZUKI TAKUMA;KO HANG-JU;SETIAWAN AGUS
分类号 C30B25/18;C30B29/38;C30B25/02;C30B33/00 主分类号 C30B25/18
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