| 摘要 |
A reaction chamber of a chemical vapor deposition apparatus is provided to easily perform a cleaning operation of a reactor, thereby improve productivity of the apparatus by dividing the reaction chamber into a chamber body and a chamber bottom plate, thereby disassembling and assembling the chamber bottom plate. A reaction chamber(3) of a chemical vapor deposition apparatus(1-1) is characterized in that: a chamber bottom plate(16) separately formed is assembled onto a bottom side of a chamber body(11) having a chamber cover(15) joined with a top side thereof in the reaction chamber; the chamber bottom plate has a circulation hole(17) vertically perforated into the center thereof; the chamber bottom plate has a bottom exhaust gas pumping hole(20) formed in a groove shape on a top face thereof at the outer side of the circulation hole; a bottom gas exhaust hole(21) is perforated from the bottom exhaust gas pumping hole to a bottom face of the chamber bottom plate; a pumping holder(22) is mounted on an end of the bottom gas exhaust hole; a pumping ring plate(23) having gas exhaust holes(24) formed therein is mounted on an upper end of the bottom exhaust gas pumping hole formed on the chamber bottom plate; and pumping ring caps are mounted on the gas exhaust holes formed in the pumping ring plate.
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