| 摘要 |
PROBLEM TO BE SOLVED: To correct a defective portion in a pattern formed on a substrate by stably applying a correction liquid on the defective portion regardless to the kind or the state of the correction liquid. SOLUTION: A pattern defect correction device determines a moving distance of a probe 92 descending to a paste container 83 based on a length determination function determining the length of the top of the probe 92 to be dipped in a paste 831 according to the kind and the coating amount of the paste 831; and a positioning cylinder 91 descends the probe 92 according to the determined moving distance. COPYRIGHT: (C)2009,JPO&INPIT
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