| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a beam amount measuring device and a semiconductor device in which an accurate measuring can be conducted without depending on a variation volume of a size of an open port of an aperture. SOLUTION: The beam amount measuring device is provided with an aperture having at least two open ports of different sizes, a measuring piece which can measure each of the bean amounts passing through each of the open ports, and a calculating unit which, based on a measured value of the measuring pieces and an initial value of the size of the open ports, calculates a beam amount not depending on a variation volume of the size of the open ports and a variation amount of the size of the open ports. COPYRIGHT: (C)2009,JPO&INPIT
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