| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning apparatus capable of suppressing adhesion of fine particles to the surface of a work after cleaning. SOLUTION: The cleaning apparatus is a cleaning apparatus 1 for cleaning a work W and equipped with a cleaning bath 2 to be filled with a cleaning solution F to clean the work W, a work support part 4 for supporting the work W and transporting the work inside and outside of the cleaning solution F in the cleaning bath 2, and a shielding part 6 for shielding the surrounding of the work support part 4 to isolate the work support part 4 from the outside environments. The shielding part 6 has a flow-in port 6B and a discharge port and in the inside of the shielding part 6, air current toward the discharge port from the flow-in port 6B via the upper part of the cleaning bath 2 is formed. COPYRIGHT: (C)2009,JPO&INPIT
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