发明名称 |
Method for fabricating nanometer-scale structure |
摘要 |
In a method for fabricating a nanometer-scale structure by arranging nanotubes in a predetermined direction at a predetermined position, the method for fabricating a nanometer-scale structure comprises a first step of planarizing a substrate by etching a predetermined part by irradiating a focused energy beam to the sample, a second step of decomposing and depositing an organic gas into a columnar structure with an objective of determining the position and direction, and a third step of attaching and fixing the nanotube by using the thus deposited columnar structure as a standard of position and direction.
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申请公布号 |
US7476418(B2) |
申请公布日期 |
2009.01.13 |
申请号 |
US20040951000 |
申请日期 |
2004.09.27 |
申请人 |
SII NANOTECHNOLOGY INC. |
发明人 |
YASUTAKE MASATOSHI;KAITO TAKASHI;SHIRAKAWABE YOSHIHARU;KITAJIMA ITARU |
分类号 |
B82B3/00;C23C16/00;B05D3/06;B82B1/00;C01B31/00;C01B31/02;C23C8/00;C23C14/30;C23C16/48;C23C18/00;C23C18/14;C23C20/00;D01C5/00;D01F9/12;D01F9/127;G01Q70/12;H05B7/00 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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