发明名称 Mask for sequential lateral solidification and method of performing sequential lateral solidification using the same
摘要 Embodiments of a mask for sequential lateral solidification are disclosed herein. In some embodiments, a mask of the present disclosure comprises a transmission region including a first slit column having a plurality of first slits separated from one another by a predetermined interval, and a second slit column having a plurality of second slits separated from one another by a predetermined interval and disposed adjacent to and offset from the first slit column. An irradiated laser beam is substantially completely transmitted through the transmission region. In some embodiments, the mask includes a semi-transmission region including a first opening pattern disposed at least partially between adjacent first slits and having a plurality of first openings formed into a desired shape, and a second opening pattern disposed at least partially between adjacent second slits and having a plurality of second opening formed into a desired shape. A portion of less than all of the laser beam is transmitted through the semi-transmission region. A method of performing the sequential lateral solidification using the mask is also disclosed herein.
申请公布号 US7476475(B2) 申请公布日期 2009.01.13
申请号 US20060544924 申请日期 2006.10.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK CHEOL HO
分类号 G03F1/00 主分类号 G03F1/00
代理机构 代理人
主权项
地址