发明名称 Liquid flow proximity sensor for use in immersion lithography
摘要 An apparatus and method for precisely detecting very small distances between a measurement probe and a surface, and more particularly to a proximity sensor using a constant liquid flow and sensing a liquid mass flow rate within a bridge to detect very small distances. Within the apparatus the use of a flow restrictor and/or snubber made of porous material and/or a liquid mass flow rate controller enables detection of very small distances in the nanometer to sub-nanometer range. A further embodiment wherein a measurement channel of a proximity sensor is connected to multiple measurement branches.
申请公布号 US7472579(B2) 申请公布日期 2009.01.06
申请号 US20060360514 申请日期 2006.02.24
申请人 ASML HOLDING N.V. 发明人 VIOLETTE KEVIN J.
分类号 G01B13/08;G01F1/00;G01B13/12;G01B13/22;G03F7/20;G05D7/01;H01L21/027 主分类号 G01B13/08
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