Optical arrangement for extreme UV lithography device, has reflective optical elements including particular operating temperature, where optical characteristics of arrangement are optimized for operation

摘要

The arrangement has an optical element that is arranged in a beam path (6) of the optical arrangement and reflects radiation in a soft X-ray or extreme UV (EUV) wavelength range. One of reflective optical elements (9, 10, 14, 15) in the beam path and an optical surface (9a) of the optical element has a particular operating temperature, where optical characteristics of the optical arrangement are optimized for operation at a given operating temperature with an optical design of the reflective optical element. Independent claims are also included for the following: (1) an extreme UV lithography device comprising an optical arrangement (2) a method for providing a reflective optical element.