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发明名称
原子层沉积制程之前驱物的清除方法
摘要
一种原子层沉积制程之前驱物清除方法,包含在一原子层沉积制程前驱物清除步骤之时段中,利用间歇通入惰性气体与停止通入惰性气体,来有效率的清除反应室中所残留之前驱物及其副产物。其中前驱物清除步骤之时段系指自一前驱物通入步骤结束到下一前驱物开始通入之期间。
申请公布号
TW200900526
申请公布日期
2009.01.01
申请号
TW096122806
申请日期
2007.06.23
申请人
茂德科技股份有限公司
发明人
李名言;吴孝哲;蔡文立
分类号
C23C16/455(2006.01);C23F4/00(2006.01);C23C16/44(2006.01)
主分类号
C23C16/455(2006.01)
代理机构
代理人
王宗梅
主权项
地址
新竹市新竹科学工业园区力行路19号3楼
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