发明名称 Semiconductor device
摘要 A semiconductor device includes a spaced-channel IGBT and an antiparalell diode that are formed in a same semiconductor substrate. The IGBT includes a base layer and insulated gate trenches by which the base layer is divided into a body region connected to an emitter and a floating region disconnected from the emitter. The IGBT is formed in a cell region of an IGBT region, and the diode is formed in a diode region. A boundary region of the IGBT region is located between the cell region and the diode region. A spacing between adjacent gate trenches in the boundary region is less than a spacing between adjacent gate trenches between which the floating region is located in the cell region.
申请公布号 US2009001411(A1) 申请公布日期 2009.01.01
申请号 US20080155949 申请日期 2008.06.12
申请人 DENSO CORPORATION 发明人 TOKURA NORIHITO;SONE HIROKI;AMANO SHINJI;KATO HISATO
分类号 H01L29/739 主分类号 H01L29/739
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