发明名称 METHOD AND APPARATUS FOR MONITORING VIAS IN A SEMICONDUCTOR FAB
摘要 <p>A method for monitoring a semiconductor fabrication process creates a wafer of semiconductor chips. Each chip has a one or more diodes. Each diode is addressable as part of an array, corresponds to a physical location of the chip, and is connected in series to a stack. The stack is composed of one ore more vertical interconnects and metal contacts. The diode and associated stack of vertical interconnects is addressed, and the current through each of the stacks of vertical interconnects in an array is measured.</p>
申请公布号 WO2009002812(A1) 申请公布日期 2008.12.31
申请号 WO2008US67595 申请日期 2008.06.20
申请人 MICROCHIP TECHNOLOGY INCORPORATED;YACH, RANDY;STEVENS, TOMMY 发明人 YACH, RANDY;STEVENS, TOMMY
分类号 H01L21/66;H01L23/544 主分类号 H01L21/66
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