| 摘要 |
<p>A method for simplifying photo mask manufacturing process is provided to reduce a process time and a manufacturing cost by not using a resist. A method for simplifying photo mask manufacturing process comprises the following steps: a step for forming a black matrix film on a transparent substrate(100); a step for forming a light-shield pattern(111) on the transparent substrate by patterning the black matrix film; a step for transferring a pattern by performing a lithography process in the black matrix film; and a step for selectively exposing the transparent substrate by performing a photolithography process in the black matrix film in which pattern is transferred.</p> |
