发明名称 |
MATERIAL OF THE RESIST-PROTECTING MEMBRANE FOR IMMERSION LITHOGRAPHY |
摘要 |
<p>To provide a resist protective film material for immersion lithography. An alkali soluble resist protective film material for immersion lithography, which comprises a polymer (F) containing repeating units (F U ) formed by polymerizing a polymerizable compound (f m ) having a fluorine-containing bridged cyclic structure. For example, repeating units (F U ) are repeating units formed by polymerizing a compound (f) selected from the group consisting of the following formulae (f1) to (f4) (R F represents H, F, a C 1-3 alkyl group or a C 1-3 fluoroalkyl group, and X F represents F, OH or CH 2 OH.)</p> |
申请公布号 |
EP2009499(A1) |
申请公布日期 |
2008.12.31 |
申请号 |
EP20070740750 |
申请日期 |
2007.03.30 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
TAKEBE, YOKO;WANG, SHU-ZHONG;YOKOKOJI, OSAMU;SHIROTA, NAOKO;MATSUKAWA, YASUHISA;SHIRAKAWA, DAISUKE |
分类号 |
G03F7/11;C08F20/24;H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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