| 发明名称 |
PHOTOSENSITIVE ELEMENT, METHOD FOR FORMATION OF RESIST PATTERN, AND METHOD FOR PRODUCTION OF PRINT CIRCUIT BOARD |
| 摘要 |
<p>A photosensitive element comprises a support, a photosensitive layer and a protective film laminated in that order, wherein the photosensitive layer is composed of a photosensitive resin composition containing a binder polymer, a photopolymerizing compound, a photopolymerization initiator and a compound with a maximum absorption wavelength of 370-420 nm, and the protective film is composed mainly of polypropylene.</p> |
| 申请公布号 |
EP2009497(A1) |
申请公布日期 |
2008.12.31 |
| 申请号 |
EP20070741595 |
申请日期 |
2007.04.13 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
SAITOU, MANABU;ISO, JUNICHI;ICHIKAWA, TATSUYA;OHASHI, TAKESHI;YORI, HANAKO;MIYASAKA, MASAHIRO;KUMAKI, TAKASHI |
| 分类号 |
G03F7/031;G03F7/11;H05K3/06;H05K3/18 |
主分类号 |
G03F7/031 |
| 代理机构 |
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