PULSE PLASMA MATCHING SYSTEM AND METHOD THEREFOR

摘要

A pulse plasma matching system capable of preventing processing defect and method thereof are provided to perform an impedance matching of plasma by shifting a phase of an impedance matching correction pulse in order to be synchronized to a high frequency power pulse. A pulse plasma matching system capable of preventing processing defect comprises a high frequency power source(114), a phase shifter, a high frequency matching box, a network analyzer, and a controller. The high frequency power source generates a high frequency power. The phase shifter shifts a phase of a predetermined impedance matching correction pulse in order to be synchronized to a high frequency power pulse. The high frequency matching box supplies RF(Radio Frequency) power pulse to a processing chamber by matching plasma impedance using the high frequency power generated from the high frequency power source. The network analyzer measures impedance about the plasma generated from the processing chamber. The controller outputs the impedance matching correction pulse to the phase shifter.