发明名称 |
HIGH THROUGHPUT DEPOSITION APPARATUS WITH MAGNETIC SUPPORT |
摘要 |
A apparatus for depositing one or more thin film layers on one or more continuous web or discrete substrates. The apparatus includes a pay-out unit for dispensing one or a plurality of webs, a deposition unit that deposits a series of one or more thin film layers thereon, and a take-up unit that receives and stores the webs following deposition. In a preferred embodiment, deposition occurs through plasma enhanced chemical vapor deposition in which a plasma region is formed between a cathode in the deposition unit and one or more vertically-oriented webs. The instant deposition apparatus includes a support system for guiding and stabilizing the transport of one or more webs or substrates through the deposition chambers. The support system includes a magnetic guidance assembly and an edge-stabilizing assembly that operate to inhibit perturbations of the motion of a web or substrate in directions other than the direction of transport through the apparatus. ® KIPO & WIPO 2009
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申请公布号 |
KR20080111066(A) |
申请公布日期 |
2008.12.22 |
申请号 |
KR20087025210 |
申请日期 |
2008.10.15 |
申请人 |
ENERGY CONVERSION DEVICES INC. |
发明人 |
OVSHINSKY STANFORD R.;OVSHINSKY HERBERT C.;IZU MASAT;DOEHLER JOACHIM;HOFFMAN KEVIN;KEY JAMES;LYCETTE MARK |
分类号 |
H01L21/205;C23C14/56;C23C16/00;C23C16/54 |
主分类号 |
H01L21/205 |
代理机构 |
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