发明名称 HIGH THROUGHPUT DEPOSITION APPARATUS WITH MAGNETIC SUPPORT
摘要 A apparatus for depositing one or more thin film layers on one or more continuous web or discrete substrates. The apparatus includes a pay-out unit for dispensing one or a plurality of webs, a deposition unit that deposits a series of one or more thin film layers thereon, and a take-up unit that receives and stores the webs following deposition. In a preferred embodiment, deposition occurs through plasma enhanced chemical vapor deposition in which a plasma region is formed between a cathode in the deposition unit and one or more vertically-oriented webs. The instant deposition apparatus includes a support system for guiding and stabilizing the transport of one or more webs or substrates through the deposition chambers. The support system includes a magnetic guidance assembly and an edge-stabilizing assembly that operate to inhibit perturbations of the motion of a web or substrate in directions other than the direction of transport through the apparatus. ® KIPO & WIPO 2009
申请公布号 KR20080111066(A) 申请公布日期 2008.12.22
申请号 KR20087025210 申请日期 2008.10.15
申请人 ENERGY CONVERSION DEVICES INC. 发明人 OVSHINSKY STANFORD R.;OVSHINSKY HERBERT C.;IZU MASAT;DOEHLER JOACHIM;HOFFMAN KEVIN;KEY JAMES;LYCETTE MARK
分类号 H01L21/205;C23C14/56;C23C16/00;C23C16/54 主分类号 H01L21/205
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