| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate production method that can easily perform the processing, including a film deposition process, an etching process, a resist peeling process for a substrate to be processed under the presence of supercritical fluid. SOLUTION: The substrate production method is the substrate production method that processes the surface of the substrate with a step of filling a reaction chamber, where the substrate is installed with supercritical fluid and a step to make materials dissolved in this supercritical fluid react close to the surface of the substrate. The substrate is installed at the cealing 10 inside the reaction chamber, with the surface of the substrate facing downward. COPYRIGHT: (C)2009,JPO&INPIT
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