| 发明名称 |
PROCESSING SYSTEM AND METHOD FOR PERFORMING HIGH THROUGHPUT NON-PLASMA PROCESSING |
| 摘要 |
Embodiments of apparatus (100) and methods for performing high throughput non-plasma processing are generally described herein. Other embodiments may be described and claimed. |
| 申请公布号 |
WO2008109504(A3) |
申请公布日期 |
2008.12.18 |
| 申请号 |
WO2008US55623 |
申请日期 |
2008.03.03 |
| 申请人 |
TOKYO ELECTRON LIMITED;TOKYO ELECTRON AMERICA, INC.;LIMURO, SHUNICHI |
发明人 |
LIMURO, SHUNICHI |
| 分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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