| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive dry film resist which can be developed with a water-based developer and excels in resolution, flame retardancy, adhesion, moisture resistance, electric reliability and storage stability, a method for producing the same and a method for utilizing these. <P>SOLUTION: The photosensitive dry film resist has a multilayer structure including at least a first photosensitive layer and a second photosensitive layer, wherein the first photosensitive layer contains (A1) a binder polymer, (B1) a (meth)acrylic compound, (C1) a photoreaction initiator and (D1) a metal hydrate as a flame retardant as essential components, and the second photosensitive layer contains (A2) a binder polymer and (B2) a (meth)acrylic compound as essential components and does not substantially contain (D2) a flame retardant. In relation to the flame retardant (D2), the second photosensitive layer has a flame retardant content of 0-10 wt.%, and when a flame retardant content of the first photosensitive layer is considered to be 100, a flame retardant content of the second photosensitive layer is 0-50. <P>COPYRIGHT: (C)2009,JPO&INPIT |
