| 摘要 |
PROBLEM TO BE SOLVED: To suppress leakage of part of oblique incident light reflected between respective wiring layers into adjacent pixels, while eliminating the need for separately adding a manufacturing step. SOLUTION: An anti-reflective film 5 such as an SiON film is deposited on a multilayer aluminum wiring layer 4 which also works as a light shielding film, and simultaneously the resultant structure is etched to form an anti-reflective film 5 on the multilayer aluminum wiring layer 4. The material, thickness, refractive index, and light absorbance of the anti-reflective film 5 are set so that reflection can be reduced both for the light source wavelength and visible light to be used for photomask patterning, thus suppressing reflection of light by the wiring layer or the light shielding film. COPYRIGHT: (C)2009,JPO&INPIT
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