发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To manufacture a power semiconductor device whose controllable currents are large, and whose loss is low. <P>SOLUTION: At least two wide-gap semiconductor layers 1, 2 and 3, having mutually different conductivities, are laminated so that a wide-gap bipolar semiconductor element, having a built-in voltage in the forward characteristics. The wide-gap semiconductor layers 1, 2 and 3 having lamination faults are irradiated with prescribed amount of &gamma; rays, electron beam or charged particle beam of the light of a predetermined irradiation energy. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008306193(A) 申请公布日期 2008.12.18
申请号 JP20080153026 申请日期 2008.06.11
申请人 KANSAI ELECTRIC POWER CO INC:THE 发明人 SUGAWARA YOSHITAKA
分类号 H01L29/861;H01L21/8222;H01L23/34;H01L27/06;H01L29/20;H01L29/24;H01L29/74;H01L29/744;H01L31/12 主分类号 H01L29/861
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