| 摘要 |
The scanning exposure apparatus according to the present invention, which transfer-exposes a pattern on a first object M onto a second object P by using a first projection optical system PL2 arranged on a front side in a scanning direction and a second projection optical system PL1 arranged on a back side in the scanning direction, while changing positional relations of the first object and the second object with respect to the first projection optical system and the second projection optical system in the scanning direction, is characterized in that an enlargement image in a field of view on the first object is formed in an image field on the second object by each of the first projection optical system and the second projection optical system, and in that when an interval in the scanning direction between centers of the field of views of the first projection optical system and the second projection optical system is set as Dm, an interval in the scanning direction between centers of the image fields formed by the first projection optical system and the second projection optical system is set as Dp, and projection magnification of each of the first projection optical system and the second projection optical system is set as ², a condition: Dp < Dm × |²| (however, |²| > 1) is satisfied.
|
