发明名称 PREALIGNMENT SYSTEM FOR AN OPTICAL ALIGNMENT AND EXPOSURE UNSTRUMENT
摘要 1452704 Orientating articles KASPER INSTRUMENTS Inc 16 May 1974 [21 May 1973] 21815/74 Heading B8S Semi-conductive wafers 17 of rounded form with a flat portion are fed singly along an air bearing track 18 from a magazine 16 to a platform 20 which tilts so that the wafer 17 engages a flat edge portion 85 of a stop plate 65 and driven rollers 64. Only two rollers are shown: a second outer roller is hidden under transfer arm 28. The three rollers 64 are driven by a belt 78 so that the first (visible) outer roller rotates anticlockwise while the centre and second (hidden) outer roller both rotate clockwise. These latter two rollers are initially engaged by the wafer 17 and it is rotated anticlockwise on an air cushion provided on the platform 20 until the flat portion becomes aligned with the three rollers 64. In this position only the two outer rollers are engaged by the wafer 17 and, as they rotate in opposite directions, the wafer 17 ceases to rotate. The air cushion provided at the platform 20 is then terminated and the wafer 17 vacuum clamped to the platform 20, when it is in a prealigned position ready for transfer by an arm 28 to a wafer chuck 14 for further manipulation to align it with a photomask for exposure to define a desired circuit pattern.
申请公布号 GB1452704(A) 申请公布日期 1976.10.13
申请号 GB19740021815 申请日期 1974.05.16
申请人 KASPER INSTRUMENTS INC 发明人
分类号 G03F7/20;H01L21/027;H01L21/677;H01L21/68;(IPC1-7):B65H9/00 主分类号 G03F7/20
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