| 摘要 |
PURPOSE:To omit an etching step for patterning an oxidized metallic film and to simplify a manufacturing process by using a compsn. contg. a polymer solubilizable at the parts exposed to UV rays, and a metallic compd. capable of coordinating the carbonyl groups of this polymer. CONSTITUTION:The surface of a substrate is coated with an oxidized metallic film forming compsn. composed of a polymer having repeating units represented by the formula shown here solubilizable at the parts exposed to UV rays at >=250nm wavelength with high efficiency, and a metallic compd. capable of coordinating the carbonic groups of this polymer, and a solvent dissolving both of this polymer and the metallic compd. A pattern is formed by the photolithographic method, and heat treated at >=400 deg.C to form an oxidized metallic film. In the general formula, R1 is methyl, ethyl, or phenyl; and R2 is lower alkyl phenyl optionally substd. by methyl, methoxy, Cl, Br, I, or -N(CH3)2. |
