发明名称 SEGREGATING METHOD OF IMPURITY
摘要 PURPOSE:To segregate a trace amt. of impurities contained in a crystal, and to deposit effectively the impurities on the surface of the crystal by irradiating the surface of the crystal with an energy beam to melt the surface, and then growing crystals at a low solidifying rate. CONSTITUTION:An energy beam such as a laser beam, an electron beam, and an infrared beam is irradiated on the surface of a crystal to melt the surface layer. The crystal is then grown by using the unmolten part as a substrate crystal, and reducing the solidifying rate to nearly an order of magnitude lower than D/a [D is a diffusion coefficient of the impurity atom in molten liquid of mother body, and (a) is the distance between atoms]. The trace amt. of the impurities below detecting sensitivity contained uniformly in the crystal is segregated and deposited on the surface of the crystal in this way, and the analytical measurement can be easily carried out.
申请公布号 JPS6051688(A) 申请公布日期 1985.03.23
申请号 JP19830156358 申请日期 1983.08.29
申请人 NIPPON HOSO KYOKAI 发明人 SUNADA TADASHI;SATOU SHIROU;SENKAWA JIYUNICHI
分类号 C30B1/00;C30B1/08;C30B13/06;C30B29/06;G01N1/04;H01L21/208 主分类号 C30B1/00
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