发明名称 EXPOSURE DEVICE
摘要 PURPOSE:To bake a fine pattern stably for a prolonged term at low cost by forming an anode for a short-arc type mercury lamp incorporated into an exposure device to a specific shape and forming an arc spot only at the nose of a cathode. CONSTITUTION:The nose section 73 of an anode 7 for a short-arc type mercury lamp 100 is formed to a tapered shape with a flat nose surface 72. Consequently, an arc spot at the nose of the anode 7 disappears, an arc is throttled to a small shape, and an arc spot is formed only at the nose 62 of a cathode 6, and functions as a point source. Beams can be focussed easily by mounting the mercury lamp 100 so that the arc spot is positioned onto a focus in a beam-condensing lens 101, the illuminance of beams on the surface to be irradiated of a semiconductor wafer 400 can be increased without augmenting power consumption, a temperature rise is inhibited comparatively, the generation of a sputtering phenomenon at the nose section 73 is reduced remarkably, and use-life can be lengthened.
申请公布号 JPS6057930(A) 申请公布日期 1985.04.03
申请号 JP19830165864 申请日期 1983.09.10
申请人 USHIO DENKI KK 发明人 KIRA TAKEHIRO
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/30 主分类号 G03F7/20
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