ETCHING SOLUTION FOR SIMULTANEOUSLY ETCHING AL AND NI AND ETCHING METHOD WITH SAID ETCHING SOLUTION

摘要

PURPOSE:To simultaneously etch Al and Ni by using an etching soln. consisting of specified amounts of phosphoric acid, nitric acid, acetic acid and water. CONSTITUTION:An etching soln. is composed of 500-600ml/l phosphoric acid, 200-300ml/l nitric acid, 100-150ml/l water and the balance acetic acid as a diluent. When Al and Ni are etched, the etching soln. is brought into contact with part of the Al or Ni to carry out simultaneous etching.