发明名称 LIQUID PHOTOSOLDER RESIST INK COMPOSITION OF ALKALI DEVELOPMENT TYPE
摘要 <p>PURPOSE:To obtain the titled composition useful as printed circuit boards, having excellent adhesivity, heat resistance, water-vapor resistance (electrical insulating properties in water vapor absorption) and alkali developing properties, comprising a specific photo-curable polymer, a photopolymerization initiator, a reactive diluent and a solvent as main components. CONSTITUTION:The aimed composition comprising (A) a photo-curable polymer which is obtained by reacting (i) an epoxyvinyl ester polymer prepared by reaction between a cresol novolak epoxy polymer and an unsaturated monobasic acid with (ii) a polybasic acid anhydride and (iii) an alkyl ketene dimer and has <=10mgKOH/g hydroxyl number, (B) a photopolymerization initiator (e.g. benzoin), (C) a reactive diluent (e.g. 2-hydroxyacrylate) and (D) a solvent (e.g. methyl ethyl ketone) as main components.</p>
申请公布号 JPS6462375(A) 申请公布日期 1989.03.08
申请号 JP19870219803 申请日期 1987.09.02
申请人 ARAKAWA CHEM IND CO LTD 发明人 CHIHARA MACHIO;FUNABASHI MITSUKAZU
分类号 C09D11/10;C09D11/033;C09D11/102;C09D11/106;G03F7/038;H05K3/28 主分类号 C09D11/10
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